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sputtering target,coating materials,rare metal materials,high pure metal materials, precious metals,nonferrous and rare matals.  

 
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Magnetron sputtering target


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CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc.
High purity metal sputtering target:
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc.
Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services.

High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc
Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%).
In addition, CNM provides with the metalizing process of the target materials and unbounded services.



China New Metal Materials Techonology Co.,Ltd Products

Magnetron sputtering target
CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc. High purity metal sputtering target: Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc. Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services. High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%). In addition, CNM provides with the metalizing process of the target materials and unbounded services. ,Magnetron sputtering target, metal sputtering target
 
Vacuum coating material
For complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperature dielectric coating, optical film, laser aid filter, preservative, transparent conducting film, discolor film, good wide band anti-reflection film, ferromagnetic film, visible region anti-reflection, infrared anti-reflection film, spectro-film, multilayer film, high reflectance coating, resistive film, high temperature reflectance coating, cold light coating. High quality vacuum coating material: 4N-5N 1. Oxide: SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials. 2. fluoride: NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc. high purity Fluoride. 3. other compound: ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. vacuum coating materials. 4. metal coating material: high purity Al, Cu, Ti, Si, Au, Ag, Im, Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, Ni-Cr Alloy, Ti-Al Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-Al Alloy, etc. Metal coating materials. Note: the vacuum coating materials produced by CNM boasts the following advantages: high purity, no spilling, low deflation, well-distributed film, strong adhesion, better resistance to corrosion, uniform color, and so on. ,Vacuum coating material, coating materials
 
Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im,
High purity metal sputtering target: Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services. ,Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im,, nonferrous and rare metals
 
ITO target, AZO target,IGZO target, MgO target
High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc. Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services. ,ITO target, AZO target,IGZO target, MgO target, sputtering target
 
High purity alloy sputtering target
High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%). In addition, CNM provides with the metalizing process of the target materials and unbounded services. ,High purity alloy sputtering target, pure metal alloy
 
High quality vacuum coating material
1. Oxide: SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials. 2. fluoride: NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc. high purity Fluoride. 3. other compound: ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. vacuum coating materials. 4. metal coating material: high purity Al, Cu, Ti, Si, Au, Ag, Im, Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, Ni-Cr Alloy, Ti-Al Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-Al Alloy, etc. Metal coating materials. Note: the vacuum coating materials produced by CNM boasts the following advantages: high purity, no spilling, low deflation, well-distributed film, strong adhesion, better resistance to corrosion, uniform color, and so on. Contact us Tel: 86-010-85162188, 85162588 Phone: 15313888225 Fax: 86-010-85162988 E-mail:china_cnm@163.com Zip Code: 100192 Website: www.85162188.com,High quality vacuum coating material, coating materials
 
SiO, SiO2, TiO2, ZrO2, HfO2, TiO coating materials
SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials. For complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperature dielectric coating, optical film, laser aid filter, preservative, transparent conducting film, discolor film, good wide band anti-reflection film, ferromagnetic film, visible region anti-reflection, infrared anti-reflection film, spectro-film, multilayer film, high reflectance coating, resistive film, high temperature reflectance coating, cold light coating. ,SiO, SiO2, TiO2, ZrO2, HfO2, TiO coating materials, coating materials
 
NbF3, BaF2, CeF3, MgF2, LaF3 coaitng materials
1. NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc. high purity Fluoride. 2. other compound: ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. vacuum coating materials. For complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperature dielectric coating, optical film, laser aid filter, preservative, transparent conducting film, discolor film, good wide band anti-reflection film, ferromagnetic film, visible region anti-reflection, infrared anti-reflection film, spectro-film, multilayer film, high reflectance coating, resistive film, high temperature reflectance coating, cold light coating. , NbF3, BaF2, CeF3, MgF2, LaF3 coaitng materials, coating materials
 
Al, Cu, Ti, Si, Au, Ag, Im, Mg,coating materials
high purity Al, Cu, Ti, Si, Au, Ag, Im, Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, Ni-Cr Alloy, Ti-Al Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-Al Alloy, etc. Metal coating materials. Note: the vacuum coating materials produced by CNM boasts the following advantages: high purity, no spilling, low deflation, well-distributed film, strong adhesion, better resistance to corrosion, uniform color, and so on. For complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperature dielectric coating, optical film, laser aid filter, preservative, transparent conducting film, discolor film, good wide band anti-reflection film, ferromagnetic film, visible region anti-reflection, infrared anti-reflection film, spectro-film, multilayer film, high reflectance coating, resistive film, high temperature reflectance coating, cold light coating. , Al, Cu, Ti, Si, Au, Ag, Im, Mg,coating materials, coating materials
 
Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target
High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%). In addition, CNM provides with the metalizing process of the target materials and unbounded services. , Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, pure metals alloy sputtering target
 
High purity metal sputtering target:
CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display , architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc. High purity metal sputtering target: Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, Im, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc. Note: The ceramic target produced in CNM adopts the most advanced ceramic production technology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services. High purity alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Cot Alloy target, etc Note: CNM product high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%). In addition, CNM provides with the metalizing process of the target materials and unbounded services. Tel: 86-010-85162188, 85162588 Phone: 15313888225 Fax: 86-010-85162988 E-mail:china_cnm@163.com Zip Code: 100192 Website: www.85162188.com ,High purity metal sputtering target:, sputtering target
 
 
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